Two-photon lithography (TPL) has shown promise in research applications but has yet to achieve widespread industry acceptance due to limitations on large-scale part production and time-intensive setup. Scientists turned to machine learning to address two key barriers to industrialization of TPL.
Thursday, July 30, 2020
Machine learning model may perfect 3D nanoprinting
Two-photon lithography (TPL) has shown promise in research applications but has yet to achieve widespread industry acceptance due to limitations on large-scale part production and time-intensive setup. Scientists turned to machine learning to address two key barriers to industrialization of TPL.
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